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真空腔體水氣解吸附組件
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ZCUVE(零間隙紫外線發射器水蒸氣解吸係統)是(shi)水(shui)蒸(zheng)氣(qi)解(jie)吸(xi)技(ji)術(shu)的(de)新(xin)進(jin)展(zhan)。該(gai)係(xi)統(tong)通(tong)過(guo)紫(zi)外(wai)線(xian)輻(fu)射(she)有(you)效(xiao)解(jie)吸(xi)水(shui)蒸(zheng)氣(qi),特(te)別(bie)適(shi)用(yong)於(yu)大(da)型(xing)沉(chen)積(ji)腔(qiang)室(shi)等(deng)不(bu)便(bian)於(yu)在(zai)真(zhen)空(kong)室(shi)內(nei)安(an)裝(zhuang)紫(zi)外(wai)線(xian)發(fa)射(she)器(qi)的(de)應(ying)用(yong)場(chang)景(jing)。
產品詳情

真空腔體水氣解吸附組件

The ZCUVE represents the most recent advance intechnol water vapor desorption ogy. The unique design is scalable from 2.75” to 8” flange sizes with a proportionally higher UV power factor with larger flange sizes.

The ZCUVE was designed to desorb water from large deposition chambers where it is not practicable to have an exposed UV emitter inside the vacuum chamber. Standard off-the-shelf shutters can be used to prevent the ZCUVE from being coated during deposition processes.

This process works best on o-ring (Viton) sealed vacuum chambers that do not have any other way to bake out, and also for smaller sized load-locks.技術參數:


型號

法蘭口徑

Z275

2.75" / 40 CF

Z450

4.5" / 63 CF

Z600

6.0” / 100 CF

Z800

8.0” / 160 CF


An external assembly houses the UV emitter, which is situated just behind a high UV transmission, ultra-high vacuum window. A mirror on the back side of the emitter further improves the transmission of 185 nm UV radiation through the window and into the vacuum chamber. The ZCUVE housing is backfilled with an inert gas to prevent ozone production within the housing. Finally, the emitter leads are connected via MHV high voltage connectors to the control.

主要特點:

The advantage of using UVC radiation to desorb water vapor is that is produces very little heat.  Less heat means less damage to mechanical parts and samples. Another advantage is that UVC does not require a direct line of site in order to desorb
water vapor.  It can’t get into nooks and crannies, but it can reflect off of polished surfaces (like chamber walls) with a loss of 50% to 70% per " bounce" .

UVB-100

The UVB-100 uses UVC radiation to desorb water vapor without heat. The emitter extends into the vacuum chamber.


ZCUVE

The ZCUVE (Zero Clearance UV Emitter Water Vapor Desorption System) uses UVC radiation to desorb water vapor without heat. The emitter resides outside the vacuum chamber.

Note: These water vapor desorption products are designed to work with high vacuum systems, large vacuum, chambers, and load locks. They are not designed to replace radiant bake-out methods in ultra-high vacuum systems, but are UHV compatible


產品係列

型號法蘭口徑適用法蘭標準
Z2752.75英寸40 CF
Z4504.5英寸63 CF
Z6006.0英寸100 CF
Z8008.0英寸160 CF

特點:獨特的設計可從2.75英寸擴展到8英寸法蘭尺寸,更大的法蘭尺寸提供按比例更高的紫外線功率因子。

設計特點

外部發射器設計

  • 紫外線發射器安裝在外部組件中,位於高紫外線透過率的超高真空窗口後方

  • 避免紫外線發射器暴露在真空室內

  • 發射器背麵設有鏡麵,可進一步提高185 nm紫外線輻射通過窗口進入真空室的傳輸效率

  • 外殼內部填充惰性氣體,防止產生臭氧

  • 發射器引線通過MHV高壓連接器連接到控製器

兼容性

  • 可使用標準市售快門,防止ZCUVE在沉積過程中被鍍膜

  • 標準真空快門即可提供有效保護

技術優勢

低溫操作

使用UVC輻射解吸水蒸氣的優勢是產熱極少:

  • 減少熱量意味著減少對機械部件和樣品的損害

  • 適用於熱敏感材料和精密部件

非直接視線要求

UVC解吸水蒸氣不需要直接視線:

  • 雖不能進入狹小縫隙,但可以從拋光表麵(如腔室壁)反射

  • 每次"反彈"損失50%至70%的效率

  • 實現更均勻的解吸效果

產品對比

UVB-100

  • 使用UVC輻射無熱解吸水蒸氣

  • 發射器延伸到真空室內

ZCUVE

  • 使用UVC輻射無熱解吸水蒸氣

  • 發射器位於真空室外

應用領域

  • 無法進行烘烤的O型圈(Viton)密封真空腔室

  • 小型裝載鎖定腔室

  • 大型沉積腔室

  • 高真空係統

  • 大型真空腔室

重要說明

這些水蒸氣解吸產品專為高真空係統、大型真空腔室和裝載鎖定腔設計:

  • 不設計用於替代超高真空係統中的輻射烘烤方法

  • 但與超高真空係統兼容

  • 可作為輔助手段提升係統真空度和減少水氣汙染

工作原理

通過185 nm波長的UVC紫外線輻射分解水分子,使其從表麵解吸,從而:

  • 降低真空係統中的水蒸氣分壓

  • 提高係統真空度

  • 減少樣品表麵的水汙染

  • 提高薄膜沉積質量

該係統為無法進行傳統烘烤的真空係統提供了一種高效、低溫的水氣解吸解決方案。

真空腔體水氣解吸附組件
真空腔體水氣解吸附組件
真空腔體水氣解吸附組件

真空腔體水氣解吸附組件

分享

分享到微信

×
ZCUVE(零間隙紫外線發射器水蒸氣解吸係統)是(shi)水(shui)蒸(zheng)氣(qi)解(jie)吸(xi)技(ji)術(shu)的(de)新(xin)進(jin)展(zhan)。該(gai)係(xi)統(tong)通(tong)過(guo)紫(zi)外(wai)線(xian)輻(fu)射(she)有(you)效(xiao)解(jie)吸(xi)水(shui)蒸(zheng)氣(qi),特(te)別(bie)適(shi)用(yong)於(yu)大(da)型(xing)沉(chen)積(ji)腔(qiang)室(shi)等(deng)不(bu)便(bian)於(yu)在(zai)真(zhen)空(kong)室(shi)內(nei)安(an)裝(zhuang)紫(zi)外(wai)線(xian)發(fa)射(she)器(qi)的(de)應(ying)用(yong)場(chang)景(jing)。
產品詳情

真空腔體水氣解吸附組件

The ZCUVE represents the most recent advance intechnol water vapor desorption ogy. The unique design is scalable from 2.75” to 8” flange sizes with a proportionally higher UV power factor with larger flange sizes.

The ZCUVE was designed to desorb water from large deposition chambers where it is not practicable to have an exposed UV emitter inside the vacuum chamber. Standard off-the-shelf shutters can be used to prevent the ZCUVE from being coated during deposition processes.

This process works best on o-ring (Viton) sealed vacuum chambers that do not have any other way to bake out, and also for smaller sized load-locks.技術參數:


型號

法蘭口徑

Z275

2.75" / 40 CF

Z450

4.5" / 63 CF

Z600

6.0” / 100 CF

Z800

8.0” / 160 CF


An external assembly houses the UV emitter, which is situated just behind a high UV transmission, ultra-high vacuum window. A mirror on the back side of the emitter further improves the transmission of 185 nm UV radiation through the window and into the vacuum chamber. The ZCUVE housing is backfilled with an inert gas to prevent ozone production within the housing. Finally, the emitter leads are connected via MHV high voltage connectors to the control.

主要特點:

The advantage of using UVC radiation to desorb water vapor is that is produces very little heat.  Less heat means less damage to mechanical parts and samples. Another advantage is that UVC does not require a direct line of site in order to desorb
water vapor.  It can’t get into nooks and crannies, but it can reflect off of polished surfaces (like chamber walls) with a loss of 50% to 70% per " bounce" .

UVB-100

The UVB-100 uses UVC radiation to desorb water vapor without heat. The emitter extends into the vacuum chamber.


ZCUVE

The ZCUVE (Zero Clearance UV Emitter Water Vapor Desorption System) uses UVC radiation to desorb water vapor without heat. The emitter resides outside the vacuum chamber.

Note: These water vapor desorption products are designed to work with high vacuum systems, large vacuum, chambers, and load locks. They are not designed to replace radiant bake-out methods in ultra-high vacuum systems, but are UHV compatible


產品係列

型號法蘭口徑適用法蘭標準
Z2752.75英寸40 CF
Z4504.5英寸63 CF
Z6006.0英寸100 CF
Z8008.0英寸160 CF

特點:獨特的設計可從2.75英寸擴展到8英寸法蘭尺寸,更大的法蘭尺寸提供按比例更高的紫外線功率因子。

設計特點

外部發射器設計

  • 紫外線發射器安裝在外部組件中,位於高紫外線透過率的超高真空窗口後方

  • 避免紫外線發射器暴露在真空室內

  • 發射器背麵設有鏡麵,可進一步提高185 nm紫外線輻射通過窗口進入真空室的傳輸效率

  • 外殼內部填充惰性氣體,防止產生臭氧

  • 發射器引線通過MHV高壓連接器連接到控製器

兼容性

  • 可使用標準市售快門,防止ZCUVE在沉積過程中被鍍膜

  • 標準真空快門即可提供有效保護

技術優勢

低溫操作

使用UVC輻射解吸水蒸氣的優勢是產熱極少:

  • 減少熱量意味著減少對機械部件和樣品的損害

  • 適用於熱敏感材料和精密部件

非直接視線要求

UVC解吸水蒸氣不需要直接視線:

  • 雖不能進入狹小縫隙,但可以從拋光表麵(如腔室壁)反射

  • 每次"反彈"損失50%至70%的效率

  • 實現更均勻的解吸效果

產品對比

UVB-100

  • 使用UVC輻射無熱解吸水蒸氣

  • 發射器延伸到真空室內

ZCUVE

  • 使用UVC輻射無熱解吸水蒸氣

  • 發射器位於真空室外

應用領域

  • 無法進行烘烤的O型圈(Viton)密封真空腔室

  • 小型裝載鎖定腔室

  • 大型沉積腔室

  • 高真空係統

  • 大型真空腔室

重要說明

這些水蒸氣解吸產品專為高真空係統、大型真空腔室和裝載鎖定腔設計:

  • 不設計用於替代超高真空係統中的輻射烘烤方法

  • 但與超高真空係統兼容

  • 可作為輔助手段提升係統真空度和減少水氣汙染

工作原理

通過185 nm波長的UVC紫外線輻射分解水分子,使其從表麵解吸,從而:

  • 降低真空係統中的水蒸氣分壓

  • 提高係統真空度

  • 減少樣品表麵的水汙染

  • 提高薄膜沉積質量

該係統為無法進行傳統烘烤的真空係統提供了一種高效、低溫的水氣解吸解決方案。

詢價表單

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